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μPG 501激光直写系统
 
   
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μPG 501激光直写系统

最适合用于研究开发之用: μPG 501 (桌上型激光掩模板 Photo Mask 绘图机) 操作不但简单,也可对应3维的绘图模式。 应用范围: MEMS、Bio-MEMS、ASICS、Micro Optics、Micro Fluidics、光学相关等行业、需要开发高精度和高分辨率等应用软件。

购买数量:
  (库存9999+)
尺寸:63cm×70cm×51cm
光源:
二极管激光(波长:405nm / 390nm / 375nm)
描写范围:
125 mm ×125 mm
最小描写线幅:
1 μm
描绘数据:
数据转换软件可接受输入格式为GDS2、 DXF、CIF 及BMP 等

功能主要

  • 最大基板尺寸: 6 × 6 inch2
  • 最小描绘尺寸: 1 μm
  • 最小描绘网格: 50 nm
  • 最小直写范围: 125 X 125 mm2
  • 先进的灰阶曝光模式
  • 实时的自动对焦功能
  • 标准 (405nm / 390nm)、UV (375nm) LED光源
  • 多种多样的绘画数据输入格式 (DXF,CIF,BMP)
  • 用于对位的照相机系统  
  • 进阶的软、配套元件                                                                               

应用范围:
  • MEMS
  • Bio-MEMS
  • iIntegrated-optics 
  • Micro Fluid

Tabletop Maskless Aligner System

Designed with the focus on high performance at an affordable price, the μPG 501 is the perfect solution for prototyping such as MEMS, Integrated Optics, Micro Fluidics, Lab-on-a-Chip devices and Photomask fabrication. The µPG 501 offers two optional configurations. With WM-I it is possible to write structures down to 1 μm at a speed of 50 mm²/min. In WM-II you can produce features down to 2 µm with a speed of 100 mm²/min. This equals an exposure time of less than 25 min. for a 2“ x 2“ pattern. The integrated exposure wizard (GUI) guides the operator through the complete procedure: Load the substrate, select the design and start the exposure. With a footprint of 60 x 75 cm² the μPG 501 was designed to fit even into the smallest R&D laboratories, and requires only power connection and an air pressure supply to operate.
 

Applications for the µPG 501 include Life ScienceMEMSMicro-OpicsSemiconductor, Sensors, Actuators, MOEMS, Material Research, Nano-Tubes, Graphene, and any other application that requires microstructures.

For additional information please download the Fact Sheet or contact us.

Key Features

  • Write speed up to 100 mm²/ min
  • Substrates up to 6" x 6"
  • Structures down to 1 µm
  • High power LED light source
  • SLM based light engine
  • Multiple data input formats
  • Basic gray scale exposure mode
  • Camera system for alignment
  • Metrology
  • Realtime autofocus
  • User-optimized exposure wizard